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These are microscopic images of
structures fabricated at the NanoSyd laboratory, Mads Clausen Institute, The photolithographic masks used to fabricate these structures were Bluefire® Police™ 35mm film negatives exposed in a conventional 35mm SLR camera and developed in Bluefire Micro high-contrast developer. These images are copyright and are used
with permission. They must not be copied and reproduced without
permission from the copyright owner.
L-SU8: electron microscope image of a structures etched onto a silicon wafer using a mask made with Bluefire Police 35mm film.
L-PDMS: electron microscope image of a flexible mold pulled from the etched silicon original (L-SU8, above).
CROSS-SU8: a cross structure etched onto a silicon wafer using a mask made with Bluefire Police 35mm film.
CROSS-PDMS: a flexible mold pulled from the etched silicon original.
CROSS-NEG22: Bluefire Police negative enlarged with an optical microscope to show edge definition and image density.
L-NEG22: Bluefire Police negative, images enlarged with an optical microscope. The smallest lines are about 10 microns wide. |
